1 Hot wall viscous flow reactor equipped for in situ Fourier transform infrared (FTIR) investigations of film growth and etching. 1 Hot wall viscous flow reactors for routine growth and etching ...

Image Credit: Okyaytech Ald The Layerava platform has distinct advantages in growing III-Nitrides (GaN, AlN, InN, BN, TiN, and so on) with ultra-low oxygen contamination in III-Nitride films. The ...

In the last 10 years, Forge Nano has been developing and constructing a range of most reliable and sophisticated particle ALD reactor systems in the world. The company routinely uses such high quality ...

Cambridge NanoTech has combined its leading ALD expertise with advanced Computational Fluid Dynamics analyses to optimize Fiji F200 ALD reactor, heater and trap geometry. The hyperboloid reactor ...