This advancement could pave the way for a new generation of 'beyond EUV' lithography systems ... power-efficient technologies to power future EUV machines.

This advancement could pave the way for a new generation of 'beyond EUV' lithography systems ... power-efficient technologies to power future EUV machines.

Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: 10-9 meter ...

Good winter morning and best new year’s wishes to you! Here’s a rapid (5:54) rundown of recent news from the HPC-AI sector, including: SAN DIEGO – January 29, 2025 – DDC Solutions, a provider of data ...

Rapidus has taken delivery of an ASML EUV machine for installation at its Innovative Integration for Manufacturing (IIM-1) foundry under construction in Chitose, Hokkaido. It is the first time that an ...

The first decade following the introduction of high-volume EUV lithography is expected to involve optimization of the process, reaching feature sizes below 10 nm. Beyond that, switching to a ...

Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: 10-9 meter) generation 1 that support Extreme ...