Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to ... the production and inspection of the masks defining the features to be etched, and the output power of the light source.

Previous photolithography technologies used transmissive masks protected by a pellicle. For EUV lithography, however, the masks must be reflective and cannot have a protective pellicle as this ...

This enables the EUV lithography era of today, which is likely to continue for the foreseeable future. Initially, EUV became ...

No question about it. We need more computing power. SE: In 2018, Samsung and TSMC inserted EUV lithography for the 7nm process node. Now, using EUV, chipmakers are producing chips at 5nm. Nonetheless, ...

Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: 10-9 meter ...

Carbon nanotubes present a game-changing solution for preventing defects in EUV lithography, supporting the semiconductor industry's drive toward extreme miniaturization and improved chip reliability.

上周，ASML 庆祝了一个重要的里程碑--该公司的社交媒体账户分享了其第三代极紫外光（EUV）光刻工具到达一位未具名客户的消息。帖子包括几张照片 ...

Rapidus plans to install as many as 10 EUV lithography tools into its upcoming fabs in Japan, reports TrendForce, citing ...

This advancement could pave the way for a new generation of 'beyond EUV' lithography systems that produce chips quicker and with less power. Of course, implementing BAT technologies into ...