Extreme ultraviolet lithography - Wikipedia
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
Extreme ultraviolet lithography | Nature Reviews Methods Primers
2024年11月28日 · Extreme ultraviolet lithography (EUVL) was recently adopted by the semiconductor industry as the leading-edge lithography technique for continued miniaturization of semiconductor devices in line...
EUV lithography systems – Products - ASML
Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.
Extreme ultraviolet lithography: A review - AIP Publishing
2007年10月11日 · Extreme ultraviolet lithography (EUVL) was thoroughly reviewed over a broad range of topics, including history, tools, source, metrology, condenser and projection optics, resists, and masks. Since 1988, many studies on EUVL have been conducted in North America, Europe, and Japan, through state sponsored programs and industrial consortiums.
One of the main advancements in semiconductor manufacturing is using extreme ultraviolet (EUV) light (13.5 nm wavelength) for lithography. EUV light allows smaller features to be built on a semiconductor, increasing device area density. Developing commercial high-throughput EUV
Low-cost energy-efficient EUV lithography for advanced ... - Nature
2025年1月3日 · Extreme ultraviolet (EUV) lithography has become an indispensable tool for fabricating these chips. Although EUV lithography can directly produce tiny features, 8 nm and smaller, the high capital ...
Extreme ultraviolet lithography | Nature Reviews Methods Primers
2024年11月28日 · This PrimeView highlights the future impacts of extreme ultraviolet lithography on semiconductor devices.
Extreme ultraviolet (EUV) lithography is the latest innovation in a long line of technical accomplishments that have supported the semiconductor industrys adherence to Moore us law from the 1960s to present. 7 In semiconductor fabrication, lithography is
EUV: Extreme Ultraviolet Lithography - Semiconductor …
2021年10月5日 · Extreme ultraviolet (EUV) lithography is a soft X-ray technology, which has a wavelength of 13.5nm. Today’s EUV scanners enable resolutions down to 22nm half-pitch. In a system, an EUV light source makes use of a high power laser to create a plasma.
Pushing the Boundaries of Moore’s Law: How Can Extreme UV …
2022年6月3日 · Today, the chip industry has entered a new era: extreme ultraviolet lithography (EUVL), a revolutionary technique that deploys short wavelengths of just 13.5 nanometers, which is about 40 times smaller than visible light and 20 times smaller than UV light.
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