An aligner, or mask aligner, is a system that produces integrated circuits (IC) using the photolithography process. It holds the photomask over the silicon wafer while a bright light is shone through the mask and onto the photoresist.

The SUSS Mask Aligner has become synonymous with superior quality, high alignment accuracy, and sophisticated exposure optics. SUSS offers a complete range of mask aligners for high-end fab automation, high volume production and R&D environments alike.

We offer a broad portfolio of field-proven products that include Mask Aligners, UV Exposure Systems, UV Light Sources, UV Measurement Instruments, Resistivity Meters, Solar Simulators, I-V Testers and Calibrated Reference Cells.

The best mask aligner solutions available. Technology – Unique features enabling the most demanding next generation designs; Price – Top notch quality delivering outstanding reliability and the lowest cost of ownership; Experience – Industry …

For backside alignment, the Model 6000 Mask Aligner has a stable optical train, long distance microscopes, and advanced auto alignment software giving the most repeatable front to backside alignment accuracy.

Compact Aligner Platform for Research and Low-Volume Production. The MA/BA Gen4 series represents the latest generation of SUSS’s semi-automated mask and bond aligner and introduces a new platform system.

The mask aligner UV-KUB 3 is the first mask alignment system equipped with a UV-LED light source, that provide an unrivalled collimation and homogeneous exposure, on the international market.

Accommodating wafers and substrates up to 300 mm, varying in size, shape and thickness, EVG’s mask alignment systems aim to provide sophisticated solutions with a high grade of automation for advanced applications and full flexibility for research and development.

A mask aligner is a precision machine tool used in the semiconductor manufacturing process to transfer a pattern onto a wafer or substrate; these patterns are micro and nano in scale.

With the MA100/150e Gen2 SUSS has designed a dedicated mask aligner platform for processing high brightness LEDs (HB-LED) on substrates up to 150 mm. With its high precision mask alignment, sophisticated substrate handling for fragile, warped and transparent wafers and its high resolution down to 0.7 µm the MA100/150e Gen2 can overcome all ...